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US Patent Issued to ASML Netherlands on June 23 for "Methods and systems to calibrate reticle thermal effects" (Dutch Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,663,725, issued on June 23, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands). "Methods and systems to calibrate reticle thermal e... Read More


US Patent Issued to ASML NETHERLANDS, CYMER on June 23 for "Optimization of lithographic process based on bandwidth and speckle" (Dutch, American Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,663,726, issued on June 23, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands) and CYMER LLC (San Diego). "Optimization of lithogra... Read More


US Patent Issued to ASML Netherlands on June 23 for "Method for correcting measurements in the manufacture of integrated circuits and associated apparatuses" (Dutch, Belgian Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,663,727, issued on June 23, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands). "Method for correcting measurements in the manufact... Read More


US Patent Issued to KLA on June 23 for "Oblique illumination for overlay metrology" (Israeli, American Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,663,728, issued on June 23, was assigned to KLA Corp. (Milpitas, Calif.). "Oblique illumination for overlay metrology" was invented by Andrew V... Read More


US Patent Issued to ASML Netherlands on June 23 for "On chip sensor for wafer overlay measurement" (Dutch, American Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,663,729, issued on June 23, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands). "On chip sensor for wafer overlay measurement" was ... Read More


US Patent Issued to Onto Innovation on June 23 for "Front-to-back overlay (FTBO) standard" (New Hampshire, New Jersey, Massachusetts Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,663,730, issued on June 23, was assigned to Onto Innovation Inc. (Wilmington, Mass.). "Front-to-back overlay (FTBO) standard" was invented by K... Read More


US Patent Issued to CANON on June 23 for "Exposure apparatus, exposure method, and article manufacturing method" (Japanese Inventor)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,663,731, issued on June 23, was assigned to CANON K.K. (Tokyo). "Exposure apparatus, exposure method, and article manufacturing method" was inv... Read More


US Patent Issued to Taiwan Semiconductor Manufacturing on June 23 for "System and method for thermal management of reticle in semiconductor manufacturing" (Taiwanese Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,663,732, issued on June 23, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan). "System and method for thermal manag... Read More


US Patent Issued to ASML Netherlands on June 23 for "Lithography apparatus with improved stability" (Dutch Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,663,733, issued on June 23, was assigned to ASML Netherlands B.V. (Veldoven, Netherlands). "Lithography apparatus with improved stability" was ... Read More


US Patent Issued to CANON on June 23 for "Toner" (Japanese Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,663,734, issued on June 23, was assigned to CANON K.K. (Tokyo). "Toner" was invented by Tomohisa Sano (Shizuoka, Japan), Kazuyuki Sato (Kanagaw... Read More